Optical Metrology

The Metrology Laboratory role is to
  • Evaluate optical quality of X-ray mirrors and substrates for APS beamlines and users, in order to ensure compliance with the user's specifications in terms of figure error and finish.
  • Characterize X-ray mirror-bender assemblies and specialized optics.
  • Support in-house optics development by providing accurate metrology data
  • Carry out joint R&D programs to develop new metrology measurement techniques and instrumentation.

The metrology lab houses an array of non-contact profilers customized to evaluate optics and cover the wide range of surface spatial frequencies that are relevant to X-ray optics. These include a slope measuring system (i.e.; a long trace profiler), a laser figure interferometer; a microscope interferometer for surface roughness measurements with microstitching capability.

These instruments are housed in a class 10,000 cleanroom located on the APS experiment hall floor, near Sector 1.

Work requests can be submitted by filling the Optics Group's work request form

 
Slope Measuring System (Long Trace Profiler - LTP)

The X-ray optics metrology laboratory is equipped with a Long Trace Profiler / Nanometric Optical Measurement (LTP/NOM) system to examine the  slope and curvature of mirror surfaces up to 1.5 m long with 50 nradians (rms) resolution.

 
Current features include
  • Measurement of optics up to 1.5 m long
  • Can accommodate multiple sensors to cover a wide range of measurement needs in 1-D and 2-D.
  • Currently uses an autocollimator to measure surface slope with resolution of about 50 nrad.
  • Temperature stability: 0.05K over 48 hours.
 
Roughness Microscope

Optical micro-roughness is measured with the Zygo NexView µinterferometry system operating in either phase-shifting interferometry (PSI) or coherence scanning (CSI) modes, using 633 nm wavelength light. Incrementally variable zoom is used to examine fields-of-view ranging in area from (85 µm × 85 µm) to (6 mm × 6 mm) with micro stitching capabilities for larger areas. 
 

 
Fizeau Interferometer

While optical metrology tools are adequate for day-to-day measurements and for rapid turnaround measurements to support the fabrication of K-B mirrors by profile coating, the true validation of an x-ray optics is best done at the working x-ray wavelength. To this end, an x-ray Talbot grating interferometer system is currently being implemented as standard for optics evaluation at 1-BM Optics and Detectors Testing beamline using operations funds. Typically, such work is performed as part of ongoing R&D programs or as part of collaborative efforts with the end user.