Abstract:

Recent development of nanofabrication technology makes semiconductor devices have smaller form factor for high performance, continuing to require novel metrology methods with high sensitivity. Among lots of solutions to it, I and other three colleagues are designated to verify computational imaging methods for future candidate. Since the final goal is using EUV source and I was the only one having major near to it, I had to construct and understand the ptychographic reconstruction algorithm and related algorithms. This presentation includes what I have done in Samsung Electronics as far as it does not reveal confidential information.

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