APS Secondary DI Water Systems
Water from the DI primary system is distributed to the APS via secondary pumping stations that provide final temperature control and delivers the water at the design pressure. The main components of each secondary station consists of an operating pump, a standby pump, temperature control mixing valve, leak detection system, differential pressure bypass valve, water polishing loop, and µm (micron) final filter. Two types of secondary pumping stations have been constructed; the most common type consists of two (2) pumps, and operating pump and a dedicated standby pump, the other station consists of multiple operating pumps and a single shared standby pump.
The function of the secondary pump and associated control valve is to provide the required close temperature control tolerance as near the point of use as possible. Further, the secondary pump provides the high pressure differential required by the technical equipment without imposing a high pressure on the main (primary) distribution system. This distribution of the system pressure permits the construction of a lower pressure primary system.
Temperature control is maintained by the modulation of the three way mixing valve, which mixes primary supply water with return water from the secondary loop. The system relies on the heat of friction in the piping and the waste heat from the technical equipment as a source of reheat for temperature control.
20 systems dedicated to Storage Ring components (magnets, power supplies, absorbers, front ends)
- Nominal flow - 400 g.p.m
- Supply pressure - 140 psig
- Available pressure - 110 psid
- Supply temperature - 78° F ± 0.5° F
- Pumps - centrifugal 2x3x10, 304 stainless steel, 3600 rpm 75 HP motor
- Each system has a lead and stand-by pump.
- Piping mains - 6 inch, schedule 10, 304 SS
- Filtration - 100% of flow rate, 2 micron filters
- Temperature Control - 3-way mixing valve by Worcester Valve, PID loop by Johnson Control Metasys
- Safety interlocks - hard wired high pressure switch, leak detection by supply/return flow differential
Two-Pump Storage Ring Water System
Two-Pump Storage Ring System
3-Way Mixing Temperature Control Valve
Bypass Pressure Control Valve
Multi-Pump RF Water System
