Argonne National Laboratory

2012 APS/CNM/EMC Users Meeting
May 7-9, 2012

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CNM Short Courses: Thursday, May 10, 2012

A. Functional Imaging with Ambient Atomic Force Microscopy flier
B. Confocal Raman Microscopy
C. Practical Methods for Fabricating Nanostructures and Devices
D. High-performance Computing Techniques for Materials Modeling and Nanophotonics

Location: Building 440
Morning sessions:  8:30 - 12:00
Afternoon sessions:  1:30 - 5:00
Fee is $50 per course (in addition to the meeting registration fee).

Please note that each course has a maximum attendance limit. Requests received after the course has filled will be placed on a wait list. These courses are quite technical and geared for serious potential future users.

A. Functional Imaging with Ambient Atomic Force Microscopy
(Full Day, max. capacity 30, Rm. A105/106)
Organizer: Maxim Nikiforov

Scanning probe microscopy (SPM) is one of the few techniques that allows examination at sub-100 nm resolution of materials' structure together with physical, electrical, thermal, and mechanical properties. The goal of this short course is to acquaint participants with recent developments in ambient SPM through short lectures, to provide an opportunity to observe functional imaging of materials performed by industry professionals, and to measure properties of the samples provided by workshop participants.

Attendees are encouraged to bring a sample of interest; please contact the instructor Maxim Nikiforov (maximnik@anl.gov) for sample limitations prior to arrival.

B. Confocal Raman Microscopy
(Half Day-Morning, max. capacity 10, Rm. B108)
Organizer: Dave Gosztola

A hands-on demonstration of the capabilities of the CNM's confocal Raman microscope will be presented. Subjects to be discussed and demonstrated include:

    * Basic Raman spectroscopy concepts
    * Anatomy of a confocal Raman microscope
    * Sample preparation
    * Simple spectra collection
    * Effects of excitation wavelength
    * Point mapping
    * Line/area mapping
    * Z-profiling

Attendees are encouraged to bring a sample of interest; please contact the instructor David Gosztola (gosztola@anl.gov) for sample limitations prior to arrival.

C. Practical Methods for Fabricating Nanostructures and Devices
(Full Day, max. capacity 25, Upstairs Gallery)
Organizer:  Ralu Divan

This tutorial will cover the practical aspects of nanofabrication that are not commonly found in textbooks. Topics will  include work flow planning, how to consider the materials to be used, criteria for selecting processes and instruments, and the interrelation between them. Examples of devices made by staff in the Nanofabrication and Devices Group will be shown.  A brief facility tour may conclude the day.

D. High-performance Computing Techniques for Materials Modeling and Nanophotonics
(Half Day-Morning, max. capacity 15, Rm. A201)
Organizer:  Michael Sternberg

Abstract coming soon.


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