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Users Week 2009
May 4-6, 2009

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Workshop 3:
NextGen Nanopositioning: Engineering Robust Systems for Manipulation and Analysis

Organizers: Russell Cook (EMC), Curt Preissner (APS)

Date: Wednesday, May 6, 2009, afternoon

Room: Bldg. 440 (Center for Nanoscale Materials, Sector 26), Rm. 105/106

This workshop will bring together engineers and instrument scientists who are interested in advancing the state of the art in nanopositioning. The goal of this workshop is to discuss the engineering developments that will facilitate the goals of next-generation x-ray optics, nano-manipulation, and electron microscopy. It is meant to provide a forum for the three major user centers at Argonne (APS, CNM, and EMC) to share ideas in nanopositioning.

Nanopositioning is a key enabling technology for x-ray scanning microprobes, x-ray nanotomography, and lensless x-ray imaging. Advances in nanopositioning engineering need to be commensurate with expected advances in x-ray optics and electron microscopy. The x-ray nanopositioning problem requires a large dynamic range with motions on the order of millimeters, and future 10-nm optics will require 1-nm resolution. Nanotomography with 30 nm resolution requires a total rotational error of 15 nm. In addition, environmental control of the sample may be required from cryogenic temperatures to hundreds of degrees. The engineering of nanopositioning systems is best accomplished with a system-oriented approach, that is, through joint consideration of the mechanics, sensing, and controls aspects of the design.

Advances in electron microscopy such as TEAM (transmission electron aberration-corrected microscopy), in which sub-Ångstrom (or 0.05 nanometer) resolution is becoming the norm, and the drive towards in situ experiments (e.g., STM/TEM, tribology, and nanoindentation) will require nanopositioning systems to push towards picometer (per hour) stability, accuracy, and repeatability in very small volumes. Further, the necessity for nanoscale studies of other analytical techniques and the trend of shrinking scales in nanomaterials manipulation will require new solutions in nanopositioning.



Welcome and Introduction
1:35–2:15 Nanopositioning Techniques Development for Synchrotron Radiation Instrumentation at the APS: The Present and the Future
Deming Shu, Advanced Photon Source, Argonne National Laboratory
2:20–3:00 Robust Broadband Nanopositioning: A Control Systems Perspective
Srinivasa M. Salapaka, University of Illinois at Urbana-Champaign

3:05–3:30 Coffee break
3:30–4:10 MEMS Technology for Manipulation and Control of Optical Signals
Daniel López, Center for Nanoscale Materials, Argonne National Laboratory
4:15–4:55 A High-stability TEM Sample Stage with Five Degrees of Freedom
Thomas Duden, National Center for Electron Microscopy, Lawrence Berkeley National Laboratory
5:00 Adjourn



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