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Workshop 7 - Center for Nanoscale Materials
Thursday, May 10
Bldg. 401, Rm. A5000
9:00 - 12:00
1:30 - 4:45
WK7 - In Situ Studies of Interfacial Reactivity
Organizers:
Dillon D. Fong, Argonne National Laboratory
Hoydoo You, Argonne National Laboratory
To agenda > Updated 4/15/07
Overview
Recently, there have been many significant advances in our ability to
characterize dynamically evolving interfaces as well as a growing
appreciation of the need for in situ techniques in understanding
interfacial behavior. A longstanding scientific question regards the
connection between atomic-scale structure and chemical dynamics at
interfaces in complex environments, a critical issue for a wide range of
disciplines including film deposition/etching, surface
functionalization, nanopatterning, catalysis, and geochemical processes.
While in situ synchrotron techniques are renown for their ability to
probe buried structure in non-vacuum environments, true progress will
require a complement of additional in situ tools such as SUM-frequency
spectroscopy, electron microscopy, and scanning probe microscopy. This
workshop will bring together researchers in a diverse array of fields to
share scientific concepts and techniques focused on
in situ studies of interfacial reactivity.
Agenda
| 8:55 - 9:00 |
Opening Remarks |
| 9:00 - 9:30 |
Intelligent Catalysts for Automotive Emissions Control
Jun'ichiro Mizuki,
Japan Atomic Energy Research Institute, Japan
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| 9:30 - 10:00 |
Vibrational Sum-Frequency Generation Studies of Reactivity and Dynamics at Interfaces
Dana Dlott, University of Illinois at Urbana-Champaign
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| 10:00 - 10:30 |
X-Ray Standing Wave Imaging of Atoms at Interfaces
Michael J. Bedzyk, Northwestern University |
| 10:30 - 10:45 |
Break |
| 10:45 - 11:15 |
Using Real-time Electron Microscopy to Understand Nucleation and Growth in Semiconducting Nanowires and Carbon Nanotubes
Eric A. Stach, Purdue University |
| 11:15 - 11:45 |
Synchrotron X-ray Studies of Surfaces under Extreme Conditions
Kee-Chul Chang, Argonne National Laboratory
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| 12:00 - 1:30 |
Lunch |
| 1:30 - 2:00 |
In situ Growth Studies of Complex Oxides during Pulsed Laser Deposition: XRD versus RHEED
Guus Rijnders, University of Twente, Netherlands |
| 2:00 - 2:30 |
Oxidation Kinetics and Chemical Depth Profile of Stainless Steel
Do-Young Noh, Gwangju Institute of Science and Technology, South Korea |
| 2:30 - 2:45 |
Break |
| 2:45 - 3:15 |
Influence of Nonequilibrium Conditions on Thin Film Stress Evolution
Eric Chason, Brown University |
| 3:15 - 3:45 |
Title TBD
Randall L. Headrick, University of Vermont |
| 3:45 - 4:15 |
The Hunt for the Snark: Mapping Nucleation Centers and Surface Effects in Low-Dimensional Ferroelectrics
Sergei Kalinin, Oak Ridge National Laboratory |
| 4:15 - 4:45 |
In situ X-ray Studies of the III-Nitride MOCVD Process
Fan Jiang, Argonne National Laboratory |
| 4:45 - 4:50 |
Closing Remarks |
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