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Users Week 2007
May 7-12, 2007

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Workshop 7 - Center for Nanoscale Materials

Thursday, May 10
Bldg. 401, Rm. A5000
9:00 - 12:00
1:30 - 4:45

WK7 - In Situ Studies of Interfacial Reactivity

Organizers:
Dillon D. Fong, Argonne National Laboratory
Hoydoo You, Argonne National Laboratory

To agenda > Updated 4/15/07


Overview

Recently, there have been many significant advances in our ability to characterize dynamically evolving interfaces as well as a growing appreciation of the need for in situ techniques in understanding interfacial behavior. A longstanding scientific question regards the connection between atomic-scale structure and chemical dynamics at interfaces in complex environments, a critical issue for a wide range of disciplines including film deposition/etching, surface functionalization, nanopatterning, catalysis, and geochemical processes. While in situ synchrotron techniques are renown for their ability to probe buried structure in non-vacuum environments, true progress will require a complement of additional in situ tools such as SUM-frequency spectroscopy, electron microscopy, and scanning probe microscopy. This workshop will bring together researchers in a diverse array of fields to share scientific concepts and techniques focused on in situ studies of interfacial reactivity.

Agenda

8:55 - 9:00 Opening Remarks
9:00 - 9:30

Intelligent Catalysts for Automotive Emissions Control
Jun'ichiro Mizuki, Japan Atomic Energy Research Institute, Japan

9:30 - 10:00 Vibrational Sum-Frequency Generation Studies of Reactivity and Dynamics at Interfaces
Dana Dlott, University of Illinois at Urbana-Champaign
10:00 - 10:30 X-Ray Standing Wave Imaging of Atoms at Interfaces
Michael J. Bedzyk, Northwestern University
10:30 - 10:45 Break
10:45 - 11:15 Using Real-time Electron Microscopy to Understand Nucleation and Growth in Semiconducting Nanowires and Carbon Nanotubes
Eric A. Stach, Purdue University
11:15 - 11:45

Synchrotron X-ray Studies of Surfaces under Extreme Conditions
Kee-Chul Chang, Argonne National Laboratory

12:00 - 1:30 Lunch
1:30 - 2:00 In situ Growth Studies of Complex Oxides during Pulsed Laser Deposition: XRD versus RHEED
Guus Rijnders, University of Twente, Netherlands
2:00 - 2:30 Oxidation Kinetics and Chemical Depth Profile of Stainless Steel
Do-Young Noh, Gwangju Institute of Science and Technology, South Korea
2:30 - 2:45 Break
2:45 - 3:15 Influence of Nonequilibrium Conditions on Thin Film Stress Evolution
Eric Chason, Brown University
3:15 - 3:45 Title TBD
Randall L. Headrick, University of Vermont
3:45 - 4:15 The Hunt for the Snark: Mapping Nucleation Centers and Surface Effects in Low-Dimensional Ferroelectrics
Sergei Kalinin, Oak Ridge National Laboratory
4:15 - 4:45 In situ X-ray Studies of the III-Nitride MOCVD Process
Fan Jiang, Argonne National Laboratory
4:45 - 4:50 Closing Remarks

 

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