Argonne National Laboratory

Users Week 2007
May 7-12, 2007

Argonne Home > Argonne Home > Advanced Photon Source >

Home
Program
Registration & Abstracts
Workshops
Exhibitors
Practical Matters
Awards
Updates

Deadlines
- April 9: poster abstracts
- April 10: non-U.S. registration
- April 22: housing
- April 23: registration

Elections
- APS
- CNM

Download Poster
- 8.5 x 11
- 11 x 17

For Organizers

Committee

Past Meetings

2006
2005
2004



ß

Dillon Fong

Materials Science Division
Argonne National Laboratory
9700 S. Cass Avenue, Bldg. 212/C222
Argonne, IL 60439
USA

Ph: 630.252.3793
Fx: 630.252.6389
Em: fong@anl.gov

 

Dillon Fong

Current Position

  • Assistant Materials Scientist, Materials Science Division, Argonne National Laboratory, 2004-Present
  • Background

  • Postdoctoral Research Associate, Argonne National Laboratory, 2001-2004
  • Ph.D. Applied Physics, Harvard University, 2001
  • S.M. Applied Physics, Harvard University, 1996
  • B.S. Materials Science & Engineering, Northwestern University, 1994
  • Activities

  • Chair of “In Situ Studies of Interfacial Reactivity” CNM/APS/EMC joint workshop at 2007
  • User Meeting Technical evaluation team member for CNM instrumentation
  • General user of CNM
  • General user of APS sectors 12 and 20
  • Interests

    • Oxide nanostructures
    • Metal oxidation and catalysis
    • In situ x-ray scattering

    Goals

    A primary goal is establishing excellent communication between the CNM users and management; this will be crucial in developing and maintaining a successful user program. Other goals include working with the CNM to streamline access policies and procedures and relating the unique scientific capabilities of the CNM to the wider scientific and non-scientific communities.

     

     

    U.S. Department of Energy UChicago Argonne LLC Office of Science - Department of Energy
    Privacy & Security Notice | Contact Us | Site Map