Registration & Abstracts


Practical Matters






Workshop 5

Tuesday, May 2
Bldg. 402, Rm. E1100/E1200
1:30 pm - 5:30 pm


Leonidas Ocola, Argonne National Laboratory
John Rogers, University of Illinois at Urbana-Champaign

Progress in nanoscience and nanotechnology depends strongly on the capabilities of techniques for patterning and chemically modifying materials at the nanoscale. The methods that are currently available span a very wide range, from those that have emerged from research and development in the microelectronics area (e.g., electron beam lithography, photolithography, etc.) to newer classes of low-cost techniques designed to enable manipulation of soft materials. This workshop covers, in a broad way, recent developments in nanopatterning with applications. 

Confirmed agenda as of April 18, 2006

1:30 - 1:55

Electron beam lithography
Don Tennant, Lucent Technologies

1:55 - 2:20  Holographic 3D lithography
Shu Yang, University of Pennsylvania
2:20 - 2:45    

Patterned organic semiconductors
Zhenan Bao, Stanford University

2:45 - 3:00   Block copolymer lithography
Paul Nealey, University of Wisconsin
3:00 - 3:25 Break, Bldg. 402, Atrium and Gallery
3:25 - 3:50   Direct-Write Assembly of 3D Structures
Jennifer Lewis, University of Illinois at Urbana-Champaign
3:50 - 4:15   Three-Dimensional Colloidal Nanolithography
Paul Braun, University of Illinois at Urbana-Champaign
4:15 - 4:40      Nano xerography
Heiko Jacobs, University of Minnesota
4:40 - 5:35 Wrap-up discussion

(Withdrawn: Ned Bowden)