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Workshop 5
Tuesday, May 2
Bldg. 402, Rm. E1100/E1200
1:30 pm - 5:30 pm
Nanopatterning
Organizers:
Leonidas Ocola, Argonne National Laboratory
John Rogers, University of Illinois at Urbana-Champaign
Progress in nanoscience and nanotechnology depends strongly on the capabilities of techniques for patterning and chemically modifying materials at the nanoscale. The methods that are currently available span a very wide range, from those that have emerged from research and development in the microelectronics area (e.g., electron beam lithography, photolithography, etc.) to newer classes of low-cost techniques designed to enable manipulation of soft materials. This workshop covers, in a broad way, recent developments in nanopatterning with applications.
Confirmed agenda as of April 18, 2006
| 1:30 - 1:55 | Electron beam lithography |
| 1:55 - 2:20 | Holographic 3D lithography Shu Yang, University of Pennsylvania |
| 2:20 - 2:45 | Patterned organic semiconductors |
| 2:45 - 3:00 | Block copolymer lithography Paul Nealey, University of Wisconsin |
| 3:00 - 3:25 | Break, Bldg. 402, Atrium and Gallery |
| 3:25 - 3:50 | Direct-Write Assembly of 3D
Structures Jennifer Lewis, University of Illinois at Urbana-Champaign |
| 3:50 - 4:15 | Three-Dimensional Colloidal
Nanolithography Paul Braun, University of Illinois at Urbana-Champaign |
| 4:15 - 4:40 | Nano xerography Heiko Jacobs, University of Minnesota |
| 4:40 - 5:35 | Wrap-up discussion |
(Withdrawn: Ned Bowden)
