Workshop 7

Deep X-ray Lithography and LIGA

Thursday, May 5, 2005
Location: Argonne Guest House

Organizers: Carlo Segre, Illinois Institute of Technology; Derrick Mancini, Advanced Photon Source; Jeremy Kropf, Argonne National Laboratory

This workshop will explore the opportunities and challenges for research and industrial application of deep x-ray lithography and LIGA using the tunable hard x-ray source available at the Materials Research Collaborative Access Team bending magnet beamline (APS, MRCAT, Sector 10). Invited speakers will present their research on creating high-aspect-ratio structures using deep x-ray lithography and implementing LIGA technology for manufacturing. The organizers will also invite discussion of the beamline and laboratory capabilities in order to create a roadmap for future development.

1:00 pm	LIGA Microfabrication at CAMD: A Status Report on Capabilities and Projects J. Goettert, Louisiana State Univeristy - CAMD
1:30	UIC's Microfabrication Applications Laboratory (MAL): A Regional Resource for Support of LIGA and Other High-Aspect-Ratio Microfabrication A. Feinerman, University of Illinois, Chicago
2:00	Fabrication of Anti-Scatter Grids and Collimators for X-ray and Gamma-ray Imaging C.M. Tang, Creatv Microtech
2:30	The Sandia CA LiGA Program Stan Mwroka, Sandia National Laboratory
3:00	Break
3:30	LIGA at MR-CAT J. Kropf, Argonne National Laboratory
4:00	Investigation of Adhesion and Internal Stresses in Patterned SU-8 Photoresist Layers M.K. Ghantasala, Western Michigan University
4:30	Dimensional Inspection Issues with LIGA Mechanical Components B. Dearth, Honeywell International
5:00	Adjourn

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