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2005
2004

Workshop 7

Deep X-ray Lithography and LIGA

Thursday, May 5, 2005
Location: Argonne Guest House

Organizers: Carlo Segre, Illinois Institute of Technology; Derrick Mancini, Advanced Photon Source; Jeremy Kropf, Argonne National Laboratory

This workshop will explore the opportunities and challenges for research and industrial application of deep x-ray lithography and LIGA using the tunable hard x-ray source available at the Materials Research Collaborative Access Team bending magnet beamline (APS, MRCAT, Sector 10). Invited speakers will present their research on creating high-aspect-ratio structures using deep x-ray lithography and implementing LIGA technology for manufacturing. The organizers will also invite discussion of the beamline and laboratory capabilities in order to create a roadmap for future development.

1:00 pm

LIGA Microfabrication at CAMD: A Status Report on Capabilities and Projects
J. Goettert, Louisiana State Univeristy - CAMD

1:30 UIC's Microfabrication Applications Laboratory (MAL): A Regional Resource for Support of LIGA and Other High-Aspect-Ratio Microfabrication
A. Feinerman, University of Illinois, Chicago
2:00

Fabrication of Anti-Scatter Grids and Collimators for X-ray and Gamma-ray Imaging
C.M. Tang, Creatv Microtech

2:30 The Sandia CA LiGA Program
Stan Mwroka, Sandia National Laboratory
3:00 Break
3:30

LIGA at MR-CAT
J. Kropf, Argonne National Laboratory

4:00 Investigation of Adhesion and Internal Stresses in Patterned SU-8 Photoresist Layers
M.K. Ghantasala, Western Michigan University
4:30 Dimensional Inspection Issues with LIGA Mechanical Components
B. Dearth, Honeywell International
5:00 Adjourn

 


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