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2005
2004

Workshop 2

Advanced Nanopatterning

Tuesday, May 3, 2005
Location: Bldg. 401, Room A1100

Organizers: Leo Ocola and Derrick Mancini, Center for Nanoscale Materials and Advanced Photon Source

This workshop will be a forum for current CNM users who are involved in nanofabrication projects and researchers in the scientific community to share their experiences in nanofabrication at Argonne and institutions nearby. Presentations will highlight the use of the Raith 150 ebeam tool at Argonne, nanoimprint, nanoembossing, and/or other novel nanopatterning techniques (top-down or bottom-up).

  Session I
8:00 am

Opening Remarks
Leo Ocola, Center for Nanoscale Materials and Advanced Photon Source, Argonne National Laboratory

8:15

Top-down Meets Bottom-up: Electron-beam Lithography for Patterning of Molecules, Nanoparticles, and Biomolecules
Marya Lieberman, University of Notre Dame

8:45

Nanoscale Line Edge Roughness
Yuansheng Ma, University of Wisconsin-Madison

9:15

Deposition of Metal Nanorods in Lithographic Trenches
Matthew Pelton, The University of Chicago

9:45

Block Copolymer Lithography
Paul Nealey (Mark Stoykovich, Eric Williams), University of Wisconsin-Madison

10:15

Spatial Resolution Limits of Electron Beam Nanopatterning
Leonidas Ocola, Argonne National Laboratory

10:45 Break
11:00 Interplay between Exchange Bias and Uniaxial Anisotropy
Seok-Hwan Chung, Argonne National Laboratory
11:20 Fabrication of Nanomagnet Arrays for Applications as Magnetoresistive Random Access Memory Elements (MARM)
Shengyuan Wang, University of Alabama
11:40 Spin Injection, Diffusion, and Detection in Lateral Spin Valves
Yi Ji, Argonne National Laboratory

12:00 pm

Lithographically Patterned Magnetic Nanostructures
Kristen Buchanan, Argonne National Laboratory

12:20

Lunch

 

Session II

1:30

Opening Remarks
Derrick Mancini, Center for Nanoscale Materials and Advanced Photon Source, Argonne National Laboratory

1:35

Nanoimprint Lithography--An Enabling Engine for Nanotechnology and Future ICs
Stephen Y. Chou, Princeton University

2:15

Nanoimprint Technology and Its Applications
L. Jay Guo, University of Michigan, Ann Arbor

2:45 Break
3:00

Obducat NIL-2.5 Nanoimprinter--The Beginner’s Point of View
Mike Efremov, University of Wisconsin, Madison

3:20

Step and Flash Imprint Lithography
Michael Stewart, University of Texas, Austin

3:50

Soft Imprint Lithograph--Applications and Fundamental Limits in Resolution
John A. Rogers, University of Illinois at Urbana-Champaign

4:20 Break
4:30 Panel Discussion: Future Nanopatterning Directions for the CNM
5:00 Adjourn

 

 


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