Workshop 2

Advanced Nanopatterning

Tuesday, May 3, 2005
Location: Bldg. 401, Room A1100

Organizers: Leo Ocola and Derrick Mancini, Center for Nanoscale Materials and Advanced Photon Source

This workshop will be a forum for current CNM users who are involved in nanofabrication projects and researchers in the scientific community to share their experiences in nanofabrication at Argonne and institutions nearby. Presentations will highlight the use of the Raith 150 ebeam tool at Argonne, nanoimprint, nanoembossing, and/or other novel nanopatterning techniques (top-down or bottom-up).

	Session I
8:00 am	Opening Remarks Leo Ocola, Center for Nanoscale Materials and Advanced Photon Source, Argonne National Laboratory
8:15	Top-down Meets Bottom-up: Electron-beam Lithography for Patterning of Molecules, Nanoparticles, and Biomolecules Marya Lieberman, University of Notre Dame
8:45	Nanoscale Line Edge Roughness Yuansheng Ma, University of Wisconsin-Madison
9:15	Deposition of Metal Nanorods in Lithographic Trenches Matthew Pelton, The University of Chicago
9:45	Block Copolymer Lithography Paul Nealey (Mark Stoykovich, Eric Williams), University of Wisconsin-Madison
10:15	Spatial Resolution Limits of Electron Beam Nanopatterning Leonidas Ocola, Argonne National Laboratory
10:45	Break
11:00	Interplay between Exchange Bias and Uniaxial Anisotropy Seok-Hwan Chung, Argonne National Laboratory
11:20	Fabrication of Nanomagnet Arrays for Applications as Magnetoresistive Random Access Memory Elements (MARM) Shengyuan Wang, University of Alabama
11:40	Spin Injection, Diffusion, and Detection in Lateral Spin Valves Yi Ji, Argonne National Laboratory
12:00 pm	Lithographically Patterned Magnetic Nanostructures Kristen Buchanan, Argonne National Laboratory
12:20	Lunch
	Session II
1:30	Opening Remarks Derrick Mancini, Center for Nanoscale Materials and Advanced Photon Source, Argonne National Laboratory
1:35	Nanoimprint Lithography--An Enabling Engine for Nanotechnology and Future ICs Stephen Y. Chou, Princeton University
2:15	Nanoimprint Technology and Its Applications L. Jay Guo, University of Michigan, Ann Arbor
2:45	Break
3:00	Obducat NIL-2.5 Nanoimprinter--The Beginner’s Point of View Mike Efremov, University of Wisconsin, Madison
3:20	Step and Flash Imprint Lithography Michael Stewart, University of Texas, Austin
3:50	Soft Imprint Lithograph--Applications and Fundamental Limits in Resolution John A. Rogers, University of Illinois at Urbana-Champaign
4:20	Break
4:30	Panel Discussion: Future Nanopatterning Directions for the CNM
5:00	Adjourn

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