X-ray Photo-electron Emission Microscopy (X-PEEM)

Beamline
     X-PEEM measurements are performed on the 4-ID-C beam line.
 
4-ID local contact
 
What is X-PEEM?
    

The emmitted electrons from any area of a sample are a measure of the localized x-ray absorption. Using the essentailly the same optics as for a comercial scanning electron microscope a picture of the localized abosption of an incident x-ray beam can be obtained (see figure on the right). When one brings the incident beam energy near an absoprtion edge, the enhanced absoprtion provides a contrast mechanism to see the elemental distribution of a material. Furthermore, magnetic contrast canobtained from the asymmetry in photoelectron yield for opposite helicities of CP x-rays. Thus X-ray photoemission electron microscopy (X-PEEM) can be used image the magnetic configuration of large arrays of nanoscale magnetic elements with varying shapes, sizes and magnetostatic interactions between elements.

Using the pulsed nature of the synchrotron beam allows for time resolved studies.

Setup for a photo-emission microscope on beamline 4-ID-C.

 
4-ID Capabilities
  The following table gives some general capabilities of the X-PEEM instrument on 4-ID-C
 
Parameter Capability
Spacial Resolution 50 nm
Field of View 10-1000 µm
Time Resolution 100 ps
Typical data aquistion time 2 min.
References

    Work on 4-ID
  • X.F. Han et al. Phys. Rev. Lett. 98, 147202 (2007).
  • K. Guslienko et al. Phys. Rev. Lett. 96, 067205 (2006).



Posted by: Becky Gagnon ( gagnon@aps.anl.gov)
Content by: Dave Keavney ( keavney@aps.anl.gov)