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Beamline 20-BM-B: Sector 20 - Bending Magnet Beamline

X-ray Science Division, APS
Materials Science, Environmental Science, Chemistry

Description

General purpose x-ray spectroscopy beamline with multiple detection and sample environment capabilities. A toroidal focusing mirror is standard to 30 keV. Unfocused the energy range increases to 35 keV. Variable-angle harmonic-rejection mirror can also focus vertically to 30 micron. KB mirror focusing/x-ray microprobe can be set up upon request. A small 4-circle kappa geometry diffractometer is available.

Supported Techniques

X-ray absorption fine structure

Microfluorescence (hard x-ray)

micro X-ray absorption fine structure

Diffraction anomalous fine structure

Beamline Controls and Data Acquisition

Windows XP with LabView, SPEC.

Detectors

Ionization chambers
13-element and single-element Ge
Pilatus 100K
Vortex Si Drift
NaI scintillation
Si diodes
Log spiral fluorescence detector
Optical spectrometer

Additional Equipment

4-circle kappa geometry diffractometer
Displex low temperature stage (20-300K)
K-B mirror for 5 micron

Local Contacts

Name	MAHALING BALASUBRAMANIAN
Phone	630.252.0593
Email	mali@aps.anl.gov
Name	STEVE M. HEALD
Phone	630.252.9795
Email	heald@aps.anl.gov
Name	DALE L. BREWE
Phone	630.252.0582
Email	brewe@aps.anl.gov
Name	CHENGJUN SUN
Phone	630.252.0534
Email	b64944@aps.anl.gov

Beamline Specs

Source	Bending Magnet
Monochromator Type	Si(111)
Energy Range	2.7-25 keV
Resolution (ΔE/E)	$1.4 x 10$ ^-4
Flux (photons/sec)	$2 x 10$ ⁸ @10 keV
Beam Size (HxV)
Focused	5µm x 5µm
Monochromator Type	Si(111)
Energy Range	2.7-30 keV
Resolution (ΔE/E)	$1.4 x 10$ ^-4
Flux (photons/sec)	$1 x 10$ ¹¹ @10 keV
Beam Size (HxV)
Focused	200µm x 500µm
Monochromator Type	Si(111)
Energy Range	2.7-35 keV
Resolution (ΔE/E)	$1.4 x 10$ ^-4
Flux (photons/sec)	$2 x 10$ ¹⁰ @10 keV
Beam Size (HxV)
Focused	10000µm x 30µm
Unfocused	10mm x 1mm

For additional information see:
http://www.aps.anl.gov/Sectors/Sector20/

Current Status:	Operational/Accepting General Users
Access Mode:	On-site